SRM100 Film Thickness Mapping Measurement System

• Features

• System Configurations

• Specifications

• Options

• Applications                                                        

• Application Examples

• More information

· Easy to set up and operate with Window based software

· Various types of geometry substrate up to 300x300mm or 300mm in diameter

· Various types of mapping pattern such as linear, polar, square or arbitrary coordinates

· Advanced optics and rugged design for best system performance

· Array based detector system to ensure fast measurement

· Map film thickness and Refractive Index up to 5 layers

· System comes with comprehensive optical constants database and library

· Include commonly used recipes

· Advanced TFProbe Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.

· Upgradeable to MSP (Microspectrophotometer) mapping system with pattern recognition, or Large Spot for mapping over patterned or featured structure (with Zonerage Model)

· Apply to many different type of substrates with different thickness

· 2D and 3D output graphics and user friendly data management interface with statistical results

· Model: SRM100-300

· Detector: CCD Array with 2048  pixels

· Light Source: High Power DUV and DC regulated Tungsten-Halogen

· Light Delivery: Optics

· Stage¹: Black Anodized Aluminum Alloy Vacuum chuck holds 200 mm wafer

· Communication: USB & RS232

· Software: TFProbe 2.2M

· Measurement Type: Film thickness, reflection spectrum, refractive index

· Computer: Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 19” LCD Monitor

· Power: 110– 240 VAC /50-60Hz, 3 A

· Dimension: 14”(W) x 20”(D) x 14”(H)

· Weight: 100 lbs

· Warranty: One year labor and parts

• Wavelength range: 250 to 1050 nm

• Spot Size: 500 µm to 5mm

• Sample Size: up to 300 mm in diameter

• Substrate Size: up to 50mm thick

• Number of Layers^*: Up to 5 films

• Measurable thickness range^*: 10 nm to 50 µm

• Measurement Time: 2ms - 1s /site typical

• Positional Repeatability: ~1 µm

• Accuracy^*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)

• Repeatability^*: < 2Ǻ (1 sigma from 50 thickness readings  at center for 1500 Ǻ Thermal SiO2 on Si Wafer)

• Additional Models with Wavelength Extension to DUV or NIR Range: SRM100D: 190nm - 850nm

• SRM400: 900nm - 1700nm

• SRM500: 400nm - 1700nm

• Customized size: Available

• Large Spot Accessories for featured structure measurement

• Small spot accessories for highly non uniform samples

· Semiconductor fabrication (PR, Oxide, Nitride..)

· Liquid crystal display (ITO, PR, Cell gap…..)

· Biological films and materials

· Optical coatings, TiO₂, SiO₂, Ta₂O₅…..

· Semiconductor compounds

· Functional films in MEMS/MOEMS

· Amorphous, nano and crystalline Si

1. 2D thicknesses plot for Nitride layer in a three layer stack (Nitride-Oxide-Nitride on Glass)

2. 2D contour plot for Nitride layer in a three layer stack (Nitride-Oxide-Nitride on Glass)

1. System configuration and Specifications subject to change without notice

2. * Film property, surface quality and layer stack dependent

3. Customized system available for special applications

4. TFProbe is registered trademark of Angstrom Sun Technologies Inc.