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MSP500 Microspectrophotometer and Film Thickness Measurement System |
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Features: · Easy to operate with Window based software · Advanced optics and rugged design for highest uptime and the best system performance · Array based detector system to ensure fast measurement · Affordable, portable and small footprint table top design · Measure film thickness and Refractive Index up to 5 layers over micron size region · Allow to acquire reflection, transmission and absorption spectra in milliseconds · Capable to be used for real time spectra, thickness, refractive index monitoring · System comes with comprehensive optical constants database and library · Advanced Software allows user to use either NK table, dispersion or composite model (EMA) for each individual film · Integrated Vision, spectrum, simulation, film thickness measurement system · Apply to many different type of substrates with different thickness up to 200mm size · 2D and 3D output graphics and user friendly data management interface · Advanced Imaging software for dimension measurement such as angle, distance, area, particle counting and more · Various options available to meet special applications |
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System
Configuration: · Model: MSP500RTMF · Dual Detector System: CCD Array with 2048 pixels for UV-Vis and InGaAs Arrary for NIR · Light Source: High Power DUV and Visible · Stage: Black Anodized Aluminum Alloy with motorized travel distance 100mm by 75mm · Focus: Motorized Auto focus with Joystick control. · Long Working Distance Objectives: 4x, 10x, 15x, 50x (one DUV objective included) · Communication: USB · Software: TFProbe 2.2VM with Fully automatic Mapping Capability and 2D/3D graphics outputs · Measurement Type: Reflection/Transmission spectra, Film thickness/refractive index, fluorescence and feature dimensions · Computer: Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 19” LCD Monitor · Power: 110– 240 VAC /50-60Hz, 3 A · Dimension: 16’x16’x18’ (Table top setup) · Weight: 120 lbs total · Warranty: One year labor and parts |
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Specifications: · Wavelength range: 250 to 1700 nm · Wavelength Resolution: 1nm for UV-Vis and 5 nm for NIR · Spot Size: 100µm (4x), 40µm (10x), 30µm (15x), 8µm (50x) · Substrate Size: up to 20mm thick · Measurable thickness range*: 2 nm to 50 µm · Measurement Time: 2 ms minimum · Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants) · Repeatability*: < 2 Ǻ (1 sigma from 50 thickness readings for 1500 Ǻ Thermal SiO2 on Si Wafer) |
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Options:
Top · Wavelength extension to Further DUV or longer NIR range (~2500nm) · Higher power optics for smaller spot size · Customized configuration for special applications · Heating and Cooling Stage for dynamic study · Optional stage size holding samples up to 300mm · Higher wavelength range resolution down to 0.1nm · Various filters for special applications · Add-on accessories for fluorescence measurement · Add-on accessories for Raman applications · Add-on accessories for polarizing applications · Automatic Mapping Stage up to 300mm wafer |
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Applications:
Top · Semiconductor fabrication (PR, Oxide, Nitride..) · Liquid crystal display (ITO, PR, Cell gap…..) · Forensics, Biological films and materials · Inks, Mineralogy, Pigments, Toners · Pharmaceuticals, Medial Devices · Optical coatings, TiO2, SiO2, Ta2O5….. · Semiconductor compounds · Functional films in MEMS/MOEMS · Amorphous, nano and crystalline Si |
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Application
Examples:
Top 1. Measured Transmission Spectra for Color Pixels
2. Measured Film Thickness of TiO2 on Silicon
3. Measured Reflection Spectra over a MEMS Device Inside/Outside a Via-hole
4. Digital Imaging Function in MSP300 System
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| Note: 1. System configuration and Specifications subject to change without notice 2. * Film property, surface quality and layer stack dependent 3. Customized system available for special applications 4. TFProbe is registered trademark of Angstrom Sun Technologies Inc. |
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| Copyright ©2002 - 2009 Angstrom Sun Technologies, Inc. All Rights Reserved Last modified: November 18, 2009 |