Integrated Solution for In-Line Film Thickness Monitoring with Spectroscopic Reflectometer

Features

System Configuration

Specifications

Options

Applications

More Info

· Low cost

· Easy to set up

· Easy to operate with Window based software

· Advanced optics design for best system performance

· Array based detector system to ensure fast measurement

· Uniquely designed light source for better intensity stability

·Real time or in-line Monitoring film thickness and Refractive Index up to 5 layers

· Multiple Channel/Multiple Sites Simultaneous Measurement

· System comes with comprehensive optical constants database and library

· Configurable to MSP (Microspectrophotometer) system, SRM Mapping system

· Apply to many different type of substrates with different thickness

· RS232 Protocol for Host Control

· Auto log spectrum, thickness results and fitting graphs

· Advanced Global ZR model allows to extract local desired information from Large Spot Area Measurement over the patterned structure such as IMD, ILD1, ILD3 etc.

· Wavelength range: 400 to 1000 nm

· Spot Size: 500 µm to 20mm

· Sample Size: Any

· Substrate Size: Any

· Measurable thickness range^*: 20 nm to 50 µm

· Measurement Time: 2 ms minimum

· Accuracy^*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)

· Repeatability^*: < 1 Ǻ (1 sigma from 50 thickness readings for 1500 Ǻ Thermal SiO2 on Si Wafer)

· Transmission Mode

· Micro spot for measuring small area down to 5 µm size

· Multiple Channel for simultaneously measurement at multiple locations

· Motorized X-Y Stage

· Other wavelength range coverage from DUV to IR

· Customized design or modification to fit specific application

· Semiconductor fabrication (PR, Oxide, Nitride..)

· Liquid crystal display (ITO, PR, Cell gap…..)

· Solar Cell industry

· Inks, Mineralogy, Pigments, Toners

· Pharmaceuticals, Medial Devices

· Optical coatings, TiO₂, SiO₂, Ta₂O₅…..

· Semiconductor compounds

· Functional films in MEMS/MOEMS

· Amorphous, nano and crystalline Si

Please contact us.

1. System configuration and Specifications subject to change without notice

2. * Film property, surface quality and layer stack dependent

3. Customized system available for special applications

4. TFProbe is registered trademark of Angstrom Sun Technologies Inc.