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Ellipsometer_Reflectometer_Overview

Ellipsometer_Reflectometer_Models

Ellipsometer_Reflectometer_Guide

Spectroscopic Ellipsometer
Spectroscopic Ellipsometer SE200BA
Spectroscopic Ellipsometer SE200BM
Spectroscopic Ellipsometer SE200-MSP
Spectroscopic Ellipsometer SE200AA

Spectroscopic Ellipsometer SE200AM

Microspectrophotometer

Microspectrophotometer MSP100

Microspectrophotometer MSP300

Microspectrophotometer MSP500

Spectro Reflectometer

Spectroscopic Reflectometer SR100

Spectroscopic Reflectometer SR300

Spectroscopic Reflectometer SR500

Spectroscopic Reflectometer SR Mapping System

Spectroscopic Reflectometer SRM100-300

Spectroscopic Reflectometer SRM300-300

TFProbe Software

Spectroscopic Reflectometer TFProbe 2.0

TFProbe 3.0

Spectroscopic Reflectometer In-Line Metrology

Spectroscopic Reflectometer Accessories

 

Spectroscopic Ellipsometer SE200BA-MSP Film Thickness Measurement System

       ·  Features

       ·  System Configurations

       ·  Specifications

       ·  Options

       ·  Applications

       ·  More Information

Features:

· Easy to set up

· Easy to operate with Window based software

· Advanced optics design for best system performance

·      Automatically change incident angles at 0.01 degree resolution

·     High Power DUV-VIS light source for broad band applications

· Array based detector system to ensure fast measurement

· Measure film thickness and Refractive Index up to 12 layers

· Capable to be used for real time or in-line thickness, refractive index monitoring

· System comes with comprehensive optical constants database and library

· Advanced TFProbe 3.0 Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.

·     Three different user level control: Engineer mode, system service mode and easy user mode

·     Flexible engineer mode for various recipe setup and optical model testing

·     Robust one click button (Turn-key) solution for quick and routine measurement

·     Configurable measurement parameters, user preference and easiness of operation

·     Fully automatic calibration and initialization for system

·     Precise sample alignment interface from sample signal directly, no external optics needed

·     Precise height and tilting adjustment

· Apply to many different type of substrates with different thickness

· Various options, accessories available for special configurations such as mapping stage, wavelength extension, focus spot etc.

· 2D and 3D output graphics and user friendly data management interface

· Digital Imaging Tool for Micron region selection

· Integrated Reflectometer for Reflection measurement over small region

System Configuration:

· Model: SE200BA-MSP-M300

· Detector: Detector Array

· Light Source: High Power DUV-Vis-NIR Combined Light Source

· Incident Angle Change: Automatic with Program setting

· Stage: Automatic Mapping with Rho-Theta configuration

· Software: TFProbe 3.2

· Combined SE and MSP

· Computer: Intel Duo Core Processor

· Monitor 19" Wide Screen LCD

· Power: 110– 240 VAC /50-60Hz, 6 A

· Warranty: One year labor and parts

Specifications:

· Wavelength range: 250 to 1000 nm

· Wavelength resolution: 1 nm

· Spot Size: 1 to 5 mm variable

· Incident Angle Range: 10 to 90 degree

· Incident Angle Change Resolution: 0.01 degree

· Digital Imaging: 1.3 MegPixels

· Effective Magnification: 1200x

· Long Work distance objective (12mm)

· MSP Beam Size: Variable 2 - 500 um

· Sample Size: up to 300 mm in diameter

· Substrate Size: up to 20mm thick

· Measurable thickness range*: 0 nm to 10 µm

· Measurement Time: ~ 1s/Site

· Accuracy*: better than 0.25%

· Repeatability*: < 1 Ǻ (1 sigma from 50 thickness readings for 1500 Ǻ Thermal SiO2 on Si Wafer)

Options:                                                                                                                      Top

· Photometry measurement for Reflection at Non normal incident angle

· Transmission Measurement Module

· High resolution digital camera

· Ultra Long work distance objective for MSP

· Mapping X-Y Stage (X-Y mode, instead of Rho-Theta mode)

· Heating /Cooling Stage

· Vertical Sample Mounting Goniometer

· Wavelength extension to further DUV or IR range

· Scanning Monochromator Setup

Applications:                                                                                                               Top

· Semiconductor fabrication (PR, Oxide, Nitride..)

· Liquid crystal display (ITO, PR, Cell gap…..)

· Forensics, Biological films and materials

· Inks, Mineralogy, Pigments, Toners

· Pharmaceuticals, Medial Devices

· Optical coatings, TiO2, SiO2, Ta2O5…..

· Semiconductor compounds

· Functional films in MEMS/MOEMS

· Amorphous, nano and crystalline Si

Application Examples:                                                                                              Top

Please contact us for more information.

Note:

1. System configuration and Specifications subject to change without notice

2. * Film property, surface quality and layer stack dependent

3. Customized system available for special applications

4. TFProbe is registered trademark of Angstrom Sun Technologies Inc.