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Dual Channel SRT System for Simultaneously Measuring Reflection, Transmission Spectra & Film Thickness |
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Features: · Easy to set up · Easy to operate with Window based software · Advanced optics design for best system performance · Array based detector system to ensure fast measurement · Measure film thickness and Refractive Index up to 5 layers · Allow to acquire reflection and transmission spectra simultaneously on the exact same spot in just milliseconds · Dual Channel spectrometer system with wide wavelength range coverage · System comes with comprehensive optical constants database and library · Advanced TFProbe Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film. · Upgradeable to MSP (Microspectrophotometer) system, SRM Mapping system, Multiple channel system, Large Spot for · direct measurement over patterned or featured structure · Apply to many different type of substrates with different thickness · 2D and 3D output graphics and user friendly data management interface |
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System Configuration: · Model: SRT100 · Detector: Dual Channel CCD Array each with 2048 pixels · Light Source: Combined High Power Deuterium and Halogen · Light Delivery: Fiber Optics · Stage: Black Anodized Aluminum Alloy with Easy Adjustment for sample height, 100mmx100mm size · Communication: USB with computer · Measurement Type: Film thickness, reflection spectrum, transmission spectrum, refractive index · Computer needed: P3 above with minimum 50 MB space · Power: 110– 240 VAC /50-60Hz, 1.5 A · Warranty: One year labor and parts |
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Specifications: · Wavelength range: 250 to 1100 nm · Spot Size: 500 µm to 5mm · Sample Size: 100x100mm or 100 mm in diameter · Substrate Size: up to 50mm thick · Measurable thickness range*: 5 nm to 50 µm · Measurement Time: 2 ms minimum · Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants) · Repeatability*: < 1 Ǻ (1 sigma from 50 thickness readings for 1500 Ǻ Thermal SiO2 on Si Wafer) |
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Options:
Top · Further DUV or Near Infrared wavelength range extension · Micro spot for measuring small area down to 5 µm size |
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Applications:
Top · Semiconductor fabrication (PR, Oxide, Nitride..) · Liquid crystal display (ITO, PR, Cell gap…..) · Forensics, Biological films and materials · Inks, Mineralogy, Pigments, Toners · Pharmaceuticals, Medial Devices · Optical coatings, TiO2, SiO2, Ta2O5….. · Semiconductor compounds · Functional films in MEMS/MOEMS · Amorphous, nano and crystalline Si |
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| Note: 1. System configuration and Specifications subject to change without notice 2. * Film property, surface quality and layer stack dependent 3. Customized system available for special applications 4. TFProbe is registered trademark of Angstrom Sun Technologies Inc. |
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| Copyright ©2002 - 2009 Angstrom Sun Technologies, Inc. All Rights Reserved Last modified: November 18, 2009 |