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SR500 Spectroscopic Reflectometer & Film Thickness Measurement System |
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Features: · Easy to set up · Easy to operate with Window based software · Advanced optics design for best system performance · Array based detector system to ensure fast measurement · Measure film thickness and Refractive Index up to 5 layers · Allow to acquire reflection, transmission and absorption spectra in milliseconds · Capable to be used for real time or in-line thickness, refractive index monitoring · System comes with comprehensive optical constants database and library · Upgradeable to MSP (Microspectrophotometer) system, SRM Mapping system, Multiple channel system, Large Spot for · direct measurement over patterned or featured structure · Apply to many different type of substrates with different thickness · Various accessories available for special configurations such as running measurement over the curve surface · 2D and 3D output graphics and user friendly data management interface |
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System
Configuration: · Model: SR500R · Dual Detectors: CCD Array for UV-Vis and InGaAs Detector Array for Near-Infrared (NIR) · Light Source: Combined Deuterium and Halogen · Light Delivery: Fiber Optics · Stage: Black Anodized Aluminum Alloy with Easy Adjustment for sample height, 200x200mm size · Communication: USB · Measurement Type: Film thickness, reflection spectrum, refractive index · Computer needed: P3 above with minimum 50 MB space · Power: 110– 240 VAC /50-60Hz, 1.5 A · Warranty: One year labor and parts |
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Specifications: · Wavelength range: 250 to 1700 nm · Spot Size: 500 µm to 5mm · Sample Size: 200x200mm or 200 mm in diameter · Substrate Size: up to 50mm thick · Measurable thickness range*: 2 nm to 150 µm · Measurement Time: 2 ms minimum · Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants) · Repeatability*: < 1 Ǻ (1 sigma from 50 thickness readings for 1500 Ǻ Thermal SiO2 on Si Wafer) |
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Options:
Top · Transmission Fixture for Transmission and Absorption Measurement (SR500RT) · Micro spot for measuring small area down to 5 µm size (MSP500) · Multiple Channel for simultaneously measurement at multiple locations (SR500xX) · Mapping uniformity over 200 or 300 mm wafer (SRM500-200 /300) |
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Applications:
Top · Semiconductor fabrication (PR, Oxide, Nitride..) · Liquid crystal display (ITO, PR, Cell gap…..) · Forensics, Biological films and materials · Medial Devices · Optical coatings, TiO2, SiO2, Ta2O5….. · Semiconductor compounds · Functional films in MEMS/MOEMS · Amorphous, nano and crystalline Si |
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| Application Examples: Top | ||
| Note: 1. System configuration and Specifications subject to change without notice 2. * Film property, surface quality and layer stack dependent 3. Customized system available for special applications 4. TFProbe is registered trademark of Angstrom Sun Technologies Inc. |
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| Copyright ©2002 - 2009 Angstrom Sun Technologies, Inc. All Rights Reserved Last modified: November 18, 2009 |