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Spectroscopic Ellipsometer
Spectroscopic Ellipsometer SE200BA
Spectroscopic Ellipsometer SE200BM
Spectroscopic Ellipsometer SE200-MSP
Spectroscopic Ellipsometer SE200AA

Spectroscopic Ellipsometer SE200AM


Microspectrophotometer MSP100

Microspectrophotometer MSP300

Microspectrophotometer MSP500

Spectro Reflectometer

Spectroscopic Reflectometer SR100

Spectroscopic Reflectometer SR300

Spectroscopic Reflectometer SR500

Spectroscopic Reflectometer SR Mapping System

Spectroscopic Reflectometer SRM100-300

Spectroscopic Reflectometer SRM300-300

TFProbe Software

Spectroscopic Reflectometer TFProbe 2.0

TFProbe 3.0

Spectroscopic Reflectometer In-Line Metrology

Spectroscopic Reflectometer Accessories


TFProbe® Software Version 3.0 for Spectroscopic Ellipsometry: Simulation, Data Acquisition and Analysis

          1. Features

          2. Specifications

          3. Interface Examples

          4. Application Examples

          5. More Information


· Work with Window based operating systems from Win 98 to Vista

· User friendly  and easy to use interface

· Integrated all-in-one functions for Simulation, Hardware Configuration and Calibration, Data Acquisition, Regression and Graphics Presentation

· Simulation on photometry and ellipsometry on spectroscopic, Variable Angle or combined parameters

· Comprehensive Optical Constants database, over 300 sets of optical constants for various materials included

· Unlimited layers in layer stack can be set up

· Each Layer or film can be defined from NK table (Library database), dispersion, interface, surface roughness or composite mixture model (EMA, effective media approximation)

· Capable to define inhomogeneous layer with linear, exponential, Gaussian etc profile

· Various dispersion model available such as Cauchy, Sellmeier, Gaussian, Tauc-Lorentz, Drude IR, Exponential, model dielectric functions etc, plus user can add unlimited absorption bands into dispersion

· Support Anisotropic layers with dispersion definition

· EMA Model can be defined with 2 or 3 materials mixture with Bruggeman or Maxwell-Garnett, both component’s volume fraction and depolarization factors can be set as variable

· Advanced regression control on single set or multiple sets data, incident angle, angle deviation, fitting range modification, backside reflection factors, weighted consideration on either ellipsometry parameters with Marquardt-Levenberg or Simplex algorithms

· 2D and 3D graphic presentation

· User level control with password protected levels

· Support both CCD-based array or Scanning monochromator detecting system

· Flexible recipe setup interface from simple measurement to one-click to results full recipe

· Support and communicate with various type of CCD based array detector systems

· Measure film thickness and optical constants (N & K) simultaneously

· Allow to acquire ellipsometry, reflection and  transmission data

· Allow for time series with fixed time step or continuous measurement which is suitable for real time monitoring and inline metrology applications

· Advanced optical constants editor and mapping profile setup


Specification:                                                                                                                          Top

· Operating systems:  Win 98, Win NT, Win 2000, Win XP and Win Vista

· Functions: Simulation, Hardware Configuration and Calibration, Data Acquisition, and Regression

· Application: Photometry and Ellipsometry

· Layer Numbers: Unlimited

· Layer Type: NK Table, dispersion. Interface, surface roughness, EMA mixture

· Algorithm: Levenberg-Marquardt or Simplex

· Computer requirement:  2.0GHz Intel or AMD Processor, 512MB RAM and 30Mb free Hard drive space


Interface Examples:                                                                                       Top


Application Examples:                                                                                     Top



1. System configuration and Specifications subject to change without notice

2. * Film property, surface quality and layer stack dependent

3. Customized system available for special applications

4. TFProbe is registered trademark of Angstrom Sun Technologies Inc.