Spectroscopic Ellipsometer SE200BA-M300

Spectroscopic Ellipsometer SE200BA-M300 Thin Film Metrology

Ellipsometry is a technique utilizing polarization state changes  after light beam reacts with probing samples. Not like reflectometer, spectroscopic ellipsometer parameters (Psi and Del) are always obtained at non normal incident angles. By varying incident angle. many more data sets can be obtained which will be helpful in refining model, reducing uncertainty and improving user's confidence on model's output. Therefore, variable angle ellipsometer is far more powerful  than fixed angle ellipsometer systems. There are two ways to change incident angles, manually or automatically. Ansgtrom Sun technologies Inc designed both angle adjustment models, manually adjusting agnle by moving arms at 5 degree interval following precisely preset slots(manual goniometer, SExxxBM, low cost version), and motorized precision goniometer with 0.01 degree resolution(SExxxBA). In addition, goniometers are engineeringed at vertical layout so samples could be placed horizontally, which is safer when handling samples. With reliable and enough raw data sets, many film properties, like thin film or coating  thickness, its optical constants (index of refraction N, extinction coefficient K), interface, porosity and even composition can be obtained through modeling. In this sense, advanced software is a must for high performance spectroscopic ellipsometer (SE) tools. We developed TFProbe 3.X version software for system setup. simulation, measurement, analysis, data management and 2D/3D graphics presentation. It is all-in-one.

Furthermore, SE200 tool covers a very broad wavelength range, from deep ultra-violet (DUV) to visible to near infrared (250 to 1100nm), a standard configuration. DUV range is useful to measure ultra thin films, like nanometer thickness range. One example is the native oxide on silicon wafer, which is typically about 2nm thick only. Deep UV spectroscopic ellipsometer is also essential when user needs to measure band gaps of many materials. Please contact us to arrange remote online demo.

Here are some words from our customer: “I want to thank Dr. Sun and his team at Angstrom Sun Technologies for all of their help with the purchasing of our Spectroscopic Ellipsometer. Dr. Sun and his team took the time to talk with us about our needs and what would best suit them. After we placed the order we experienced an exceptionally quick shipping timeframe (on site two weeks later). Once we received the well packaged ellipsometer, and with the help of one other person we were able to unbox and set up the ellipsometer. Following their well documented instructions, we had the ellipsometer ready to run. Dr. Sun answered our remaining questions and we were able to start taking measurements on our own. After we had worked with the program more, anytime a question would arise, Dr. Sun and his team’s prompt replies kept us working in the right direction into full functionality. Support included helping with the uploading of our own NK table as well as help with the modeling. Thank you Dr. Sun for taking the time to help us better understand Ellipsometry and for putting out an exceptional product”, Benjamin Sheppard at Colorado Concept Coatings     

 
Features:
  • Easy to set up and maintenance
  • Ooperated with Window based software
  • Advanced optics design for best system performance
  • Automatically change incident angles at 0.01 degree resolution
  • High Power DUV-VIS light source for broad band applications
  • Array based detector system to ensure fast measurement
  • Measure film thickness and Refractive Index for complicated layer stacks
  • Capable to be used for real time or in-line thickness, refractive index monitoring
  • System comes with comprehensive optical constants database and library
  • Advanced TFProbe 3.3 Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
  • Three different user level control: Engineer mode, system service mode and easy user mode
  • Flexible engineer mode for various recipe setup and optical model testing
  • Robust one click button (Turn-key) solution for quick and routine measurement
  • Configurable measurement parameters, user preference and easiness of operation
  • Fully automatic calibration and initialization for system
  • Precise sample alignment interface from sample signal directly, no external optics needed
  • Precise height and tilting adjustment
  • Apply to many different type of substrates with different thickness
  • Various options, accessories available for special configurations such as mapping stage, wavelength extension, focus spot etc.
  • 2D and 3D output graphics and user friendly data management interface
System Configuration:
  • Ellipsometer Model: SE200BA-M300 (as shown in photo)
  • Detector: Detector Array with Deep ultra-violet (DUV) range covered
  • Light Source: High Power DUV-Vis-NIR Combined Light Source
  • Incident Angle Change: Automatic with Program setting
  • Stage: Automatic Mapping with Rho-Theta configuration
  • Software: TFProbe 3.3
  • Computer: Intel Duo Core Processor
  • Monitor: 19" Wide Screen LCD
  • Power:  Univeral world wide power input, 110– 240 VAC /50-60Hz, 6 A
  • Warranty: One year labor and parts
Specifications:
  • Ellipsometer wavelength range: 250 to 1100 nm
  • Ellipsometer Wavelength resolution: 1 nm
  • Spot Size: 1 to 5 mm variable
  • Incident Angle Range: 10 to 90 degree
  • Incident Angle Change Resolution: 0.001 degree
  • Sample Size: up to 300 mm in diameter
  • Substrate Size: up to 20mm thick
  • Measurable thickness range*: 0 nm to 30 µm
  • Measurement Time: ~ 1s/Site
  • Accuracy*: better than 0.25%
  • Repeatability*: < 1 Å (1 sigma from 50 thickness readings for 1500 Å Thermal SiO2 on Si Wafer)
Options:
  • Photometry measurement for Reflection and/Or Transmission Measurement
  • Micro spot for measuring small area
  • Mapping X-Y Stage (X-Y mode, instead of Rho-Theta mode)
  • Heating /Cooling Stage for kenetics study
  • Vertical Sample Mounting Goniometer
  • Wavelength extension to further DUV or IR range
  • Scanning Monochromator Setup (Ellipsometer model SE200AA Series)
  • Combined with Microspectrophotometer (MSP) for patterned sample measurement with digital imaging functions
Applications:
  • Semiconductor fabrication (PR, Oxide, Nitride..)
  • Liquid crystal display (ITO, PR, Cell gap…..)
  • Forensics, Biological films and materials
  • Inks, Mineralogy, Pigments, Toners
  • Pharmaceuticals, Medial Devices
  • Optical coatings, TiO2, SiO2, Ta2O5…..
  • Semiconductor compounds
  • Functional films in MEMS/MOEMS
  • Amorphous, nano and crystalline Si
  • Photovoltaic thin films, CdTe, CdS, CIGS, AZO, CZTS.....
Application Examples:
 

Spectroscopic Ellipsometry Application Example 1: Variable Angle Ellipsometer Measured Multiple Layer Stack

One sample with 11 Layers plus one surface roughness layer (total 12 layers in model)  has been successfully measured with SE200BA tool. Ellipsometer raw data were collected at three different incident angles automatically, 65, 70 and 75 degree. All layers' thickness and their optical constants (refractive index and extinction coefficient)  were obtained by fitting all data collected. This example shows variable angle measurement capability is essential for complicated layer stack applications.

Table Results for the sample analyzed with Spectroscopic Ellipsometer

Spectroscopic Ellipsometer Analyzed 12 Layer Sample Results

Fitting Graphes for three different incident angles measured with Spectroscopic Ellipsometer SE200BA

65 Degree AOI Data Fitting (Blue curves are raw data and red curves are model data)

Spectrsocopic Ellipsometer Data Fitting-12 Layers-65 Degree

70 Degree AOI Fitting (Blue curves are raw data and red curves are model data)

Spectrsocopic Ellipsometer Data Fitting-12 Layers-70 Degree

75 Degree AOI Fitting (Blue curves are raw data and red curves are model data)

Spectrsocopic Ellipsometer Data Fitting-12 Layers-75 Degree

Measured Optical Contants for Ta2O5 Film In the Stack

Refractive Index and Extinction Coefficient for Ta2O5 Layer in 12 Layer Stack output from Spectrsocopic Ellipsometer Data Fitting

Measured Optical Contants for Al2O3 Film In the Stack

Refractive Index and Extinction Coefficient for Al2O3 Layer in 12 Layer Stack output from Spectrsocopic Ellipsometer Data Fitting

 

Note:

  • System configuration and Specifications subject to change without notice
  • * Film property, surface quality and layer stack dependent
  • Customized system available for special applications
  • TFProbe is registered trademark of Angstrom Sun Technologies Inc.
  • Simple model version without mapping stage is SE200BM
  • Other wavelength configuration is available, such as wavelength down to 225nm, 200nm or 190nm