Spectroscopic Ellipsometer SE200BM-M300

Spectroscopic Ellipsometer Model SE200BM-M300

Ellipsometry is a technique utilizing polarization state changes  after light beam reacts with probing samples. Not like reflectometer, spectroscopic ellipsometer parameters (Psi and Del) are always obtained at non normal incident angles. By varying incident angle. many more data sets can be obtained which wiil be helpful in refining model, reducing uncertainty and improving user's confidence on model's output. Therefore, variable angle ellipsometer is far more powerful  than fixed angle ellipsometers. There are two ways to change incident angles, manually or automatically. Ansgtrom Sun technologies Inc designed both angle adjustment models, manually adjusting agnle by moving arms at 5 degree interval following precisely preset slots(manual goniometer, SExxxBM, low cost version), and motorized precision goniometer with 0.001 degree resolution(SExxxBA). In addition, goniometers are engineeringed at vertical layout so samples could be placed horizontally, which is safer when handling samples. With reliable and enough raw data sets, many film properties, like film thickness, its optical constants, interface, porosity and even composition can be obtained through modeling. In this sense, advanced software is a must for high performance SE tools. We developed TFProbe 3.X version software for system setup. simulation, measurement, analysis, data management and 2D/3D graphics presentation. It is all-in-one.

SE200BM is most popular model among SE series. It covers DUV to NIR range (250 to 1100nm) with manual goniometer for incident angle changes at 5 degree interval. This brings a combination of powerful tools with relative low cost, comparing with automatic goniometer configuration(SE200BA). Array based detecting setup gives user a fast measurement, just in seconds. When a mapping or real time in situ measurement is needed, this is the best choice among all SE models. Wavelength range can be further extended down to 190nm if requested, as an option for some applications in semiconductor fields.. In this system, a combined DUV and Vis-NIR light source is used so user can use both or either one of them.  In the product photo, a 300mm motorized mapping stage is equipped. There are several other options available. Please fell free to contact us for any special needs. It's our goal to provide a tool, whatever it is standard configuration or it is customized,  to meet your application needs.

Here are some words from our customer: “The ellipsometer (Model SE200BM-M300, manufactured in 2012 and upgraded to 300mm mapping capability in 2014, by Angstrom Sun Technologies Inc.) is used daily in our department due to the reliability of the measurements, the built in software and the ease at which we can measure a large number of samples due to the 300 mm wafer mapping technology. In addition to all of this, whenever we have difficulty Dr. Sun and his team have provided excellent and prompt technical support which has been extremely helpful in modelling more challenging samples and meeting customer schedules”, Ross Anthony at Applied Materials Inc.

  • Easy to set up
  • Easy to operate with Window based software
  • Advanced optics design for best system performance
  • High Power DUV-VIS light source for broad band applications
  • Array based detector system to ensure fast measurement
  • Measure film thickness and Refractive Index up to 12 layers
  • Capable to be used for real time or in-line thickness, refractive index monitoring
  • System comes with comprehensive optical constants database and library
  • Advanced TFProbe 3.0 Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
  • Three different user level control: Engineer mode, system service mode and easy user mode
  • Flexible engineer mode for various recipe setup and optical model testing
  • Robust one click button (Turn-key) solution for quick and routine measurement
  • Configurable measurement parameters, user preference and easiness of operation
  • Fully automatic calibration and initialization for system
  • Precise sample alignment interface from sample signal directly, no external optics needed
  • Precise height and tilting adjustment
  • Apply to many different type of substrates with different thickness
  • Various options, accessories available for special configurations such as mapping stage, wavelength extension, focus spot etc.
  • 2D and 3D output graphics and user friendly data management interface
System Configuration:
  • Model: SE200BM-M300 (-M300 Mapping stage is optional)
  • Detector: Detector Array
  • Light Source: High Power DUV-Vis-NIR Combined Light Source
  • Incident Angle Change: Manual
  • Stage: Automatic Mapping with Rho-Theta configuration
  • Software: TFProbe 3.3.x
  • Computer: Intel i3 processor
  • Monitor 22" Wide Screen LCD (it is up to user's preference, laptop computer can also be provided in replacement of desktop)
  • Power: 110– 240 VAC /50-60Hz, 6 A
  • Warranty: One year labor and parts
  • Wavelength range: 250 to 1100 nm
  • Wavelength resolution: 1 nm
  • Spot Size: 1 to 5 mm variable
  • Incident Angle Range: 0 to 90 degree
  • Incident Angle Change Resolution: 5 degree interval
  • Sample Size: up to 300 mm in diameter
  • Substrate Size: up to 20mm thick
  • Measurable thickness range*: 0 nm to 20 µm
  • Measurement Time: ~ 1s/Site
  • Accuracy*: better than 0.25%
  • Repeatability*: < 1 Å (1 sigma from 50 thickness readings for 1500 Å Thermal SiO2 on Si Wafer)
  • Photometry measurement for Reflection and/or Transmission Measurement
  • Micro spot for measuring small area
  • Automatic Goniometer for Incident angle changes
  • Mapping X-Y Stage (X-Y mode, instead of Rho-Theta mode)
  • Heating /Cooling Stage
  • Vertical Sample Mounting Goniometer
  • Wavelength extension to further DUV or IR range (application specific or user's requirement)
  • Scanning Monochromator Setup
  • Combined with MSP for patterned sample measurement with digital imaging functions
  • Semiconductor fabrication (PR, Oxide, Nitride..)
  • Liquid crystal display (ITO, PR, Cell gap…..)
  • Forensics, Biological films and materials
  • Inks, Mineralogy, Pigments, Toners
  • Pharmaceuticals, Medial Devices
  • Optical coatings, TiO2, SiO2, Ta2O5…..
  • Semiconductor compounds
  • Functional films in MEMS/MOEMS
  • Amorphous, nano and crystalline Si
  • Various TCO films (ITO, FTO, IZO, AZO...)


  • System configuration and Specifications subject to change without notice
  • * Film property, surface quality and layer stack dependent
  • Customized system available for special applications
  • TFProbe is registered trademark of Angstrom Sun Technologies Inc.
  • Wavelength low limit can be configured down to 225nm, 200nm or 190nm or VUV