Spectroscopic Ellipsometer SE200BM-Solar

Spectroscopic Ellipsometer for Solar Photovoltaic Application

Ellipsometry is a technique utilizing polarization state changes  after light beam reacts with probing samples. Not like reflectometer, spectroscopic ellipsometer parameters (Psi and Del) are always obtained at non normal incident angles. By varying incident angle. many more data sets can be obtained which wiil be helpful in refining model, reducing uncertainty and improving user's confidence on model's output. Therefore, variable angle ellipsometer is far more powerful  than fixed angle ellipsometers. There are two ways to change incident angles, manually or automatically. Ansgtrom Sun technologies Inc designed both angle adjustment models, manually adjusting agnle by moving arms at 5 degree interval following precisely preset slots(manual goniometer, SExxxBM, low cost version), and motorized precision goniometer with 0.01 degree resolution(SExxxBA). In addition, goniometers are engineeringed at vertical layout so samples could be placed horizontally, which is safer when handling samples. With reliable and enough raw data sets, many film properties, like film thickness, its optical constants, interface, porosity and even composition can be obtained through modeling. In this sense, advanced software is a must for high performance SE tools. We developed TFProbe 3.X version software for system setup. simulation, measurement, analysis, data management and 2D/3D graphics presentation. It is all-in-one.

SE200BM-Solar is designed for Photovaltaic(PV) application. It covers DUV to NIR range (250 to 1100nm) with manual goniometer for incident angle changes at 5 degree interval. This brings a combination of powerful tools with relative low cost, comparing with automatic goniometer configuration(SE200BA). Array based detecting setup gives user a fast measurement, just in seconds. When a mapping or real time in situ measurement is needed, this is the best choice among all SE models. Wavelength range can be further extended up to 1700nm if requested, as an option for some applications like CdTe, CIGS film characterization.  Dependent needs, a combined DUV and Vis-NIR light source or a single Arc Xenon light source is available for use. In the product photo, a 156x156mm motorized mapping stage is equipped. In addition, a reflectometer at normal incidence is also configured. There are several other options available. Please fell free to contact us for any special needs. It's our goal to provide a tool, whatever it is standard configuration or it is customized,  to meet your application needs.

 
Features:
  • Easy to operate with Window based software
  • Advanced optics design for best system performance
  • High Power combined DUV-VIS light source or Xenon Arc light source for broad band applications
  • Array based detector system to ensure fast measurement
  • Measure film thickness and Refractive Index up to 12 layers
  • Capable to be used for real time or in-line thickness, refractive index monitoring
  • System comes with comprehensive optical constants database and library
  • Advanced TFProbe 3.0 Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
  • Three different user level control: Engineer mode, system service mode and easy user mode
  • Flexible engineer mode for various recipe setup and optical model testing
  • Robust one click button (Turn-key) solution for quick and routine measurement
  • Configurable measurement parameters, user preference and easiness of operation
  • Fully automatic calibration and initialization for system
  • Precise sample alignment interface from sample signal directly, no external optics needed
  • Precise height and tilting adjustment
  • Apply to many different type of substrates with different thickness
  • Various options, accessories available for special configurations such as mapping stage, wavelength extension, focus spot etc.
  • 2D and 3D output graphics and user friendly data management interface
System Configuration:
  • Model: SE200BM-SR-Solar
  • Detector: Detector Array
  • Light Source: High Power Combined DUV-Vis-NIR or Xenon Arc Light Source
  • Incident Angle Change: Manual
  • Stage: Automatic Mapping with X-Y configuration
  • Software: TFProbe 3.3.x
  • Computer: Intel Duo Core 2.0 GHz
  • Monitor 19" Wide Screen LCD
  • Power: 110– 240 VAC /50-60Hz, 6 A
  • Warranty: One year labor and parts
Specifications:
  • Wavelength range: 250 to 1100 nm
  • Wavelength resolution: 1 nm
  • Spot Size: 1 to 5 mm variable
  • Incident Angle Range: 0 to 90 degree
  • Incident Angle Change Resolution: 5 degree interval
  • Sample Size: up to 160x160 mm
  • Substrate Size: up to 20mm thick
  • Measurable thickness range*: 0 nm to 20 µm
  • Measurement Time: ~ 1s/Site
  • Accuracy*: better than 0.25%
  • Repeatability*: < 1 Å (1 sigma from 50 thickness readings for 1500 Å Thermal SiO2 on Si Wafer)
Options:
  • Transmission Measurement
  • Micro spot for measuring small area
  • Automatic Goniometer for Incident angle changes
  • Other sixe or mode Mapping Stage
  • Heating /Cooling Stage
  • Wavelength extension to further DUV or IR range
  • Scanning Monochromator Setup
  • Combined with MSP for patterned sample measurement with digital imaging functions
  • 45 degree tilting accessories for textured mono slicon application
Function Table:

A setup example for textured mono wafer application.

Applications:
  • Antireflection coatings, SiNx, SiOx..
  • CdTe, CIGS, CdS, Mo....
  • Amorphous, nano and crystalline Si
  • Various TCO films (ITO, FTO, IZO, AZO...)

Note:

  • System configuration and Specifications subject to change without notice
  • * Film property, surface quality and layer stack dependent
  • Customized system available for special applications
  • TFProbe is registered trademark of Angstrom Sun Technologies Inc.