Spectroscopic Ellipsometer SE500BA

Advanced Spectroscopic Ellipsometer Model SE500BA with heating Stage

Ellipsometry is a technique utilizing polarization state changes  after light beam reacts with probing samples. Not like reflectometer, spectroscopic ellipsometer parameters (Psi and Del) are always obtained at non normal incident angles. By varying incident angle. many more data sets can be obtained which wiil be helpful in refining model, reducing uncertainty and improving user's confidence on model's output. Therefore, variable angle ellipsometer is far more powerful  than fixed angle ellipsometers. There are two ways to change incident angles, manually or automatically. Ansgtrom Sun technologies Inc designed both angle adjustment models, manually adjusting agnle by moving arms at 5 degree interval following precisely preset slots(manual goniometer, SExxxBM, low cost version), and motorized precision goniometer with 0.01 degree resolution(SExxxBA). In addition, goniometers are engineeringed at vertical layout so samples could be placed horizontally, which is safer when handling samples. With reliable and enough raw data sets, many film properties, like film thickness, its optical constants, interface, porosity and even composition can be obtained through modeling. In this sense, advanced software is a must for high performance SE tools. We developed TFProbe 3.X version software for system setup. simulation, measurement, analysis, data management and 2D/3D graphics presentation. It is all-in-one.

SE500BA is most advanced model among SE series. It covers DUV to NIR range (250 to 1700nm) with automatic goniometer for incident angle changes from 20 to 90 degree at 0.01 degree resolution. Array based detecting setup gives user a fast measurement, just in seconds. When a mapping or real time in situ measurement is needed, this is the best choice among all SE models. Wavelength range can be further extended down to 190nm if requested, as an option for some applications in semiconductor fields.. In this system, a combined DUV and Vis-NIR light source is used so user can use both or either one of them.  In the product photo, a 100mmx100mm motorized mapping stage is equipped, plus also a rotary table and a motorized Z stage. There are several other options available. Please fell free to contact us for any special needs. It's our goal to provide a tool, whatever it is standard configuration or it is customized,  to meet your application needs.

 
Features:
  • Easy to operate with Window based software
  • Advanced optics design for best system performance
  • High Power DUV-VIS-NIR light source for broad band applications
  • Array based detector system to ensure fast measurement
  • Measure film thickness and Refractive Index up to 12 layers
  • Capable to be used for real time or in-line thickness, refractive index monitoring
  • System comes with comprehensive optical constants database and library
  • Advanced TFProbe 3.3.X Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
  • Three different user level control: Engineer mode, system service mode and easy user mode
  • Flexible engineer mode for various recipe setup and optical model testing
  • Robust one click button (Turn-key) solution for quick and routine measurement
  • Configurable measurement parameters, user preference and easiness of operation
  • Fully automatic calibration and initialization for system
  • Precise sample alignment interface from sample signal directly, no external optics needed
  • Precise height and tilting adjustment
  • Apply to many different type of substrates with different thickness
  • Various options, accessories available for special configurations such as mapping stage, wavelength extension, focus spot etc.
  • 2D and 3D output graphics and user friendly data management interface
System Configuration:
  • Model: SE500BA-MX100Y100
  • Detector: Detector Arrays (CCD + InGaAs)
  • Light Source: High Power DUV-Vis-NIR Combined Light Source
  • Incident Angle Change: Automatic
  • Stage: Automatic Mapping with X-Y configuration
  • Software: TFProbe 3.3.x
  • Computer: Intel Duo Core 2.0 GHz
  • Monitor 19" Wide Screen LCD
  • Power: 110– 240 VAC /50-60Hz, 6 A
  • Warranty: One year labor and parts
Specifications:
  • Wavelength range: 250 to 1700 nm
  • Wavelength resolution: ~1 nm for DUV, ~3nm for Visible and ~6nm in NIR
  • Spot Size: 1 to 5 mm variable
  • Incident Angle Range: 20 to 90 degree
  • Incident Angle Change Resolution: Automatic, 0.001 degree
  • Sample Size: up to 100x100 mm in diameter
  • Substrate Size: up to 10mm thick
  • Measurable thickness range*: 0 nm to 30 µm
  • Measurement Time: ~ 1s/Site
  • Accuracy*: better than 0.25%
  • Repeatability*: < 1 Å (1 sigma from 50 thickness readings for 1500 Å Thermal SiO2 on Si Wafer)
Options:
  • Photometry measurement for Reflection and/Or Transmission Measurement
  • Micro spot for measuring small area
  • Automatic Goniometer for Incident angle changes
  • Other mode or size Mapping Stage
  • Heating /Cooling Stage
  • Wavelength extension to further DUV or IR range
  • Scanning Monochromator Setup
  • Combined with MSP for patterned sample measurement with digital imaging functions
Applications:
  • Semiconductor fabrication (PR, Oxide, Nitride..)
  • Liquid crystal display (ITO, PR, Cell gap…..)
  • Forensics, Biological films and materials
  • Inks, Mineralogy, Pigments, Toners
  • Pharmaceuticals, Medial Devices
  • Optical coatings, TiO2, SiO2, Ta2O5…..
  • Semiconductor compounds
  • Functional films in MEMS/MOEMS
  • Amorphous, nano and crystalline Si
  • Various TCO films (ITO, FTO, IZO, AZO...)

Note:

  • System configuration and Specifications subject to change without notice
  • * Film property, surface quality and layer stack dependent
  • Customized system available for special applications
  • TFProbe is registered trademark of Angstrom Sun Technologies Inc.
  • The quote will be based on requested features and will be different from system to system