Publication List

Here is the list of our recent publications introducing ellipsometry, reflectometry and their applications. All these articles are available upon request.

1. Characterization of Thin Films and Stack in MOEMS Structure with Ellipsometry and Reflectometry Techniques. Proceedings of SPIE Volume: 5715, Micromachining and Microfabrication Process Technology X , Editor(s): Mary-Ann Maher, Harold D. Stewart, 2005, pp. 166-173

    

2. Spectroellipsometric characterization of Au-Y₂O₃-stabilized ZrO₂ nanocomposite films, Journal of Materials Research (JMR), December 2005 (with George Sirinakis, Rezina Siddique, Kathleen A. Dunn, Harry Efstathiadis, Michael A. Carpenter, Alain E. Kaloyeros)
   
   
3. Synthesis and Spectroellipsometric Characterization of Y₂O₃-stabilized ZrO₂-Au Nanocomposite Films for Smart Sensor Applications. MRS Proceedings, Fall Meeting, Volume 8462004
   
   
4. Atmospheric Stability of E-Beam Deposited Optical Thin Film Stacks. MRS Proceedings, Fall Meeting, Volume 854, 2004
   
   
5. Advanced Metrology Tool for SiGe Characterization: Infrared Spectroscopic Ellipsometer (IRSE). The 15th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 2004 Proceedings, Boston, 2004, pp. 425-432
   
   
6. Spectroscopic Ellipsometry (SE) and Grazing X-Ray Reflectometry (GXR) Analyses on Tungsten Carbide (WC_x) Films for Diffusion Barrier in Copper Metallization Schemes. Thin Solid Films, Vol. 455-456, pp. 519-524
   
   
7. Spectroscopic Ellipsometry Study on E-Beam Deposited Titanium Dioxide (TiO₂) Films. Thin Solid Films, Vol. 455-456, pp. 525-529
   
   
8. Precise Characterization of Silicon on Insulator (SOI) and Strained Silicon on Si_1-xGe_x on Insulator (SSOI) Stacks With Spectroscopic Ellipsometry. Fundamentals of Novel Oxide/Semiconductor Interfaces, Boston, 2003, MRS Proceedings, Vol. 786, pp. 103-108
   
   
9. Evaluation on Stress and Optical Property of Thin Films Used in Optical MEMS Device. Thin Films - Stresses and Mechanical Properties X MRS Proceedings, Vol. 795, pp. 479-484, 2003
   
   
10. Characterization of High-k Dielectrics by Combined Spectroscopic Ellipsometry (SE) and X-Ray Reflectometry (XRR). Fundamentals of Novel Oxide/Semiconductor Interfaces, MRS Proceedings, Vol. 786, pp. 95-102
    
    
11. Application of Spectroscopic Ellipsometry Techniques in OLED Film Development and Processing. SID/MAC OLED Research & Technology Conference, Princeton NJ 2002 SID - Society for Information Display
    
    
12. Properties of Titanium Oxide Thin Film Prepared With E-Beam Evaporation. MRS Fall Meeting Proceedings: Morphological and Compositional Evolution of Thin Films, Vol. 749, pp. 101-106
    

Please contact us to obtain copies of above articles.