Angstrom Sun Technologies Inc.

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SR-and-Film-Thickness-Measurement-Tools

Spectroscopic Reflectometer SR100

Spectroscopic reflectometer (SR) series are relative low cost and easy to use tools. By measuring reflection spectra (at normal incidence in most cases), film properties can be modeled with capable TFProbe software. If quick, routine, daily measurements on known films or simple film stack are needed in a low budget case, then SR series are a good choice. Wavelength range coverage is highly application oriented. If spectra are only of interest, like monitoring antireflection (AR) or high reflection devices' performance, then wavelength range will be most important factor in selecting tools. For example, in telecommunication application, all bands (O bands: 1260-1360nm; E band in 1360-1460nm; S band in 1460-1530nm, C band in 1530 -1560nm, L band 1565-1625nm, U band in 1625 -1675nm) are in near infrared wavelength range. To evaluate components’ performance, like antireflection coating's behavior in laser cavity, it is necessary to have such wavelength range covered. In photovoltaic area, many newly developed function films/coating are absorbing in visible range, like Copper indium gallium (di)selenide (CIGS), it is only possible to measure their thickness in transparent wavelength range which is also in the NIR range. If user needs to determine films' thickness, the optical resolution of spectrometer will also be a factor to consider. We have broad configurations available and system can be customized to meet your specific applications.

TFProbe series spectroscopic reflectometer tools have many unique features, like long working distance, adjustable working distance, large stage size, selectable light source and adjustable light source intensity, etc. Various easy add-on features are also available, like transmission, curved surface measurement adaptor, multiple channel, large or small beam setups, and so on.

Although there are several brands of spectrometer and spectrophotometers available in market, Angstrom Sun Technologies Inc delivers our Spectroscopic reflectometer tools with advanced support. Since we also make advanced spectroscopic ellipsometer systems, we provide advanced modeling support with our advanced ellipsometer tools at no cost to our customers who need assistance when using reflectometer tools. There have been many cases that customers upgrade reflectometer to ellipsometer by trading in basic model tools to meet their advanced application needs.

We have developed several versions of software for spectroscopic reflectometers. TFProbe 2.4 works under both Windows 32-Bit and 64-bit OS window systems. A more advanced version TFProbe 3.3 has also TFProbe 2.4 module integrated into it. As such, we have a complete solution for user to consider based on window's OS, advanced functionality and how simple user interface, like scientific mode or simple operator mode.

Features:

Easy to set up
Easy to operate with Window based software
Advanced optics design for best system performance
Array based detector system to ensure fast measurement
Uniquely designed light source for better intensity stability
There are four ways to adjust light intensity:
- Power output adjustment by knob from power supply
- Insert a filter into filter slot at light output exit port
- Beam size adjustment
- Integration time adjustment in Detector from TFProbe software
Measure film thickness and Refractive Index up to 5 layers
Allow to acquire reflection, transmission and absorption spectra in milliseconds
Capable to be used for real time or in-line thickness, refractive index monitoring
System comes with comprehensive optical constants database and library
Advanced TFProbe Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
Upgradeable to MSP (Microspectrophotometer) system, SRM Mapping system, Multiple channel system, Large Spot for · direct measurement over patterned or featured structure
Apply to many different types of substrates with different thickness
Various accessories available for special configurations such as running measurement over the curve surface
2D and 3D output graphics and user-friendly data management interface

System Configuration:

Model	SR100	SR300	SR400	SR450	SR500	SR600
Detector Type	CCD or CMOS Array	CCD or CMOS Array	InGaAs Array	CCD or CMOS and InGaAs Array	CCD or CMOS and InGaAs Array	InGaAs Array
Wavelength Range (nm)	190 to 1100	370 to 1100	950-1700	370-1700	190-1700	1000 – 2500
Wavelength Resolution	0.01 -3nm	0.01 -3nm	3 to 6nm	0.01 to 3nm	0.01 to 3nm	3 to 6nm
Measurable Thickness Range	5nm to 50 µm	20nm to 1000 µm	100nm to 300 µm	20nm to 200 µm	5nm to 200 µm	20nm to 300µm
Thickness Precision	< 1Å (1 sigma from 50 thickness readings for 1500Å Thermal SiO₂ on Si Wafer)
Thickness Accuracy	better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)
Reflection Probe	DUV-Vis	Vis-NIR	NIR	VIS-NIR	DUV-Vis-NIR	NIR
Stage/Sample Holder	Black Anodized Aluminum Alloy with Easy Adjustment for sample height, 200mmx200mm size
Working Distance	~ 25mm (from Sample Surface)
Measurement Time	0.1 milliseconds to 10s, user definable
User Definable	Wavelength range, wavelength points, integration time, spectra average numbers, smooth factors
Software	TFProbe 2.4 or TFProbe 3.3
Communication	USB
Operating System	Both 32bit and 64 Bit, Win XP, 7, 8, 10
Computer Requirement	P3 above with minimum 150 MB space, 2GB RAM; CD-ROM; at least 2 USB ports
Power Input	World-wide, universal 110– 240 VAC /50-60Hz, 1.5 A
Light Source	Deuterium + Tungsten Halogen	Tungsten Halogen	Tungsten Halogen	Tungsten Halogen	Deuterium + Tungsten Halogen	Tungsten Halogen
Light Source Intensity	Adjustable	Adjustable	Adjustable	Adjustable	Adjustable	Adjustable
Lifetime of Lamp(s)	4000 hrs.	10000 hrs.	10000 hrs.	10000 hrs.	4000 hrs.	10000 hrs.

Note: system will be configured within above specified wavelength ranges per quote to meet specific applications.

Options:

Example Setups (SR300) Example Setups (SR500 with Dual Detectors):

Transmission Fixture for Transmission and Absorption Measurement (SRxxx-RT)

Micro spot for measuring small area down to 5 µm size (MSPxxx)

Large Spot

In-Situ Integration and Processing Monitoring

Multiple Channel for simultaneously measurement at multiple locations (SRxxx-X)

Mapping uniformity over 200- or 300-mm wafer (SRMxxx-200 /300)

Simple, low cost measurement stage is available (SRxxx-S)

Fixture to measure curved surfaces

Applications:

Semiconductor fabrication (PR, Oxide, Nitride..)
Liquid crystal display (ITO, PR, Cell gap…..)
Forensics, Biological films and materials
Inks, Mineralogy, Pigments, Toners
Pharmaceuticals, Medical Devices
Optical coatings, TiO2, SiO2, Ta2O5…..
Semiconductor compounds
Functional films in MEMS/MOEMS
Amorphous, nano and crystalline Si
Solar Cell Films

Interface Example:

TFProbe 2.4 Interfaces:

More than 300 NK Tables

User Definable Measurement Parameters

Up to 5 Layers with NK table. Dispersion or Effective Media Mixture Model

Advanced Levenberg-Marquardt Fitting with Search and scale Functions

Fast Fourier Transfer (FFT) Method for thick films

TFProbe 3.3 Interfaces:

Work with Window based operating systems
User friendly and easy to use interface
Integrated all-in-one functions for Simulation, Hardware Configuration and Calibration, Data Acquisition, Regression and Graphics Presentation
Simulation on photometry and ellipsometry on spectroscopic, Variable Angle or combined parameters
Comprehensive Optical Constants database, over 300 sets of optical constants for various materials included
Unlimited layers in layer stack can be set up

Each Layer or film can be defined from NK table (Library database), dispersion, interface, surface roughness or composite mixture model (EMA, effective media approximation)
Capable to define inhomogeneous layer with linear, exponential, Gaussian etc profile
Various dispersion model available such as Cauchy, Sellmeier, Gaussian, Tauc-Lorentz, Drude IR, Exponential, model dielectric functions etc, plus user can add unlimited absorption bands into dispersion

Support Anisotropic layers with dispersion definition
EMA Model can be defined with 2 or 3 materials mixture with Bruggeman or Maxwell-Garnett, both component’s volume fraction and depolarization factors can be set as variable
Advanced regression control on single set or multiple sets data, incident angle, angle deviation, fitting range modification, backside reflection factors, weighted consideration on either ellipsometry parameters with Marquardt-Levenberg or Simplex algorithms
2D and 3D graphic presentation

User level control with password protected levels
Support both CCD-based array or Scanning monochromator detecting system
Flexible recipe setup interface from simple measurement to one-click to results full recipe
Support and communicate with various type of CCD based array detector systems
Allow to acquire ellipsometry, reflection and transmission data if licensed
Allow for time series with fixed time step or continuous measurement which is suitable for real time monitoring and inline metrology applications
Advanced optical constants editor and mapping profile setup
Operating systems: Win XP, Win Vista or Win 7(32Bit), Win 8(64bit), Win 10(64bit)
Functions: Simulation, Hardware Configuration and Calibration, Data Acquisition, and Regression
Application: Photometry and Ellipsometry

Application Examples:

Measured Reflection Spectra for optical Antireflection (AR) Coatings

Measured thicknesses for three layers Nitride-Oxide-Nitride on Glass

Measured Thickness for thick coating

Measured Reflection Spectrum and Thickness for Nano-crystalline Si

Note:

System configuration and Specifications subject to change without notice
Measurable thickness range and number of layers are Film property, surface quality and layer stack dependent
Customized system available for special applications
TFProbe is registered trademark of Angstrom Sun Technologies Inc.
Special configurations are available